Over time, the efficiency of ferroelectric materials in electronic devices starts to decrease, which causes the system to collapse.
Electronic Devices
Some scientists of the University of Sydney have claimed that they have developed a technology that can increase the lifespan of electronic devices. It is an important step in the field of material science, for the first time it provides a complete picture of the weaknesses in ferroelectric materials.
Ferroelectric materials are used in many devices, including items such as memory, capacitors, actuators (components that control or regulate mechanical systems) and sensors. These devices are used in industrial instruments such as computers, medical ultrasound equipment and underwater sonars.
Over time, the efficiency of the ferroelectric material in these devices starts to decrease, which causes the system to collapse. This process is called ferroelectric fatig. This is the biggest reason for the malfunction of many electric devices and due to the malfunction of these devices, the e-waste also increases continuously. Lakhs of crores of ruined electronic wastes go to waste all over the world.
Researchers at the School of Aerospace Mechanical and Mechatronic Engineering have learned how to use advanced in-situ electron microscopy for ferroelectric fatigue. Advanced microscopes were used for this technique, which has led to the success of viewing ferroelectric tearing at nanoscale and atomic levels in real time.
In this research paper published in Nature Communications, the researchers have hoped that this will give better insight into the design of ferroelectronic nano devices in the future. Xiaozhou Liao, the co-author of this paper, stated that “our discovery is an important scientific breakthrough because it shows a clear picture of how ferroelectric corrosion processes exist at the nanoscale,”
At the same time, lead researcher Dr Qianwei Huang said that although it has long been known that ferroelectric fights can shorten the lifespan of electronic devices, the lack of suitable technology could not be ascertained earlier.
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